Concepedia

Tetsuya Tatsumi

TT

Statistics

Publications

47

Citations

1.7K

H-Index

22

Active since

1993

Affiliations

The University of Osaka(Current)

Nagoya University

Association of Super-Advanced Electronics

Tokyo Institute of Technology

Tetsuya Tatsumi is an author at The University of Osaka specializing in materials science, plasma-surface interactions, and materials engineering.

Publications per year

1993–2021

47

Publications

47

Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process

Saburo Uchida, Seigo Takashima, Masaru Hori et al. · Journal of Applied Physics · 2008 · 141 citations

, , +16

Reducing Damage to Si Substrates during Gate Etching Processes

Tomokazu Ohchi, Shöji Kobayashi, Masanaga Fukasawa et al. · Japanese Journal of Applied Physics · 2008 · 120 citations

, , +17

Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4

Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 116 citations

, , +17

Radiation Damage of SiO<sub>2</sub> Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura · Japanese Journal of Applied Physics · 1994 · 94 citations

, , +17

Observation of surface reaction layers formed in highly selective SiO2 etching

Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 76 citations

, , +17

1–5 of 47