Makoto Sekine - Concepedia

Author

Makoto Sekine

Nagoya University ORCID

Also Known As

M Sekine, M. Sekine, Makoto SEKINE, Makoto Sekine, Makoto Sekine Makoto Sekine

514

Publications

Citations

H-Index

186

Concepts

All Affiliations

Nagoya University Meijo University The University of Osaka Toshiba (Japan)Kyushu University

About

Makoto Sekine is an author at Nagoya University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	31	124	3.6K
2	Natural Sciences	14	27	460
3	Medicine	5	5	298
4	Health Sciences	3	3	62
5	Management	1	1	201

Makoto Sekine

144

Publications

4.2K

Citations

H-Index

Page 1

	Year	Citations
Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Archives of Biochemistry and Biophysics Tumor BiologyNeuro-oncologyTumor InnervationGliomaPlasma-activated Medium	2016	226
Hydroxyl radical concentration profile in photo-Fenton oxidation process: Generation and consumption of hydroxyl radicals during the discoloration of azo-dye Orange II T. Maezono, Masahiro Tokumura, Makoto Sekine, Chemosphere Advanced Oxidation ProcessChemical EngineeringEngineeringPhotodegradationPhotochemistry	2010	218
Trace metal contamination in commercial fish and crustaceans collected from coastal area of Bangladesh and health risk assessment Mohammad Raknuzzaman, Md. Kawser Ahmed, Md. Saiful Islam, Environmental Science and Pollution Research Trace Metal ContaminationEngineeringEnvironmental EngineeringSeafood IndustryEnvironmental Health	2016	201
Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4 Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Chemical EngineeringEngineeringPlasma ProcessingSio2 Selective EtchingCf Radical Flux	2001	115
Control of surface reactions in high-performance SiO2 etching Tomoaki Tatsumi, Miyako Matsui, Mitsuru Okigawa, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Electrical EngineeringIncident Ion EnergyEngineeringIncident FluxesMicrofabrication	2000	115
Dielectric film etching in semiconductor device manufacturing Makoto Sekine Applied Surface Science Electrical EngineeringEngineeringMicrofabricationApplied PhysicsSemiconductor Device Fabrication	2002	105
Future of plasma etching for microelectronics: Challenges and opportunities G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Materials ScienceElectrical EngineeringDigital TwinsEngineeringPlasma Electronics	2024	103
Density control of carbon nanowalls grown by CH4/H2 plasma and their electrical properties Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Carbon Materials ScienceGraphene NanomeshesDensity ControlEngineeringPorous Carbon	2013	83
Occurrence and distribution of perfluoroalkyl acids (PFAAs) in surface water and sediment of a tropical coastal area (Bay of Bengal coast, Bangladesh) Md. Habibullah‐Al‐Mamun, Md. Kawser Ahmed, Mohammad Raknuzzaman, The Science of The Total Environment BioconcentrationEngineeringOcean PollutionMarine ChemistryChemical Contaminant	2016	79
Observation of surface reaction layers formed in highly selective SiO2 etching Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringElectron-beam LithographyIntegrated CircuitsVacuum DeviceSilicon On Insulator	2001	76

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