Mitsuru Okigawa

Control of surface reactions in high-performance SiO2 etching

Tomoaki Tatsumi, Miyako Matsui, Mitsuru Okigawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 115 citations

Electrical Engineering, Incident Ion Energy, Engineering +11

Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing

Tetsuya Tatsumi, Hisataka Hayashi, Satoshi Morishita et al. · Japanese Journal of Applied Physics · 1998 · 63 citations

Engineering, Plasma Physics, Chemistry +21

On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes

Seiji Samukawa, Yasushi Ishikawa, Shinya Kumagai et al. · Japanese Journal of Applied Physics · 2001 · 57 citations

Sio 2, Electron Density, Electrical Engineering +12

Reduction of ultraviolet-radiation damage in SiO2 using pulse-time-modulated plasma and its application to charge coupled 44 device image sensor processes

Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 42 citations

Filter Device, Engineering, Plasma Processing +20

Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes

Mitsuru Okigawa, Yasushi Ishikawa, Yoshinari Ichihashi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 39 citations

Ultraviolet Light, Engineering, Uv Absorption +20