Yasushi Ishikawa - Concepedia

Author

Yasushi Ishikawa

Tohoku University

Also Known As

Ishikawa Yasushi, Yasushi ISHIKAWA, Yasushi Ishikawa

105

Publications

793

Citations

H-Index

Concepts

All Affiliations

Tohoku University Sanyo (Japan)National Institute of Advanced Industrial Science and Technology Ehime University The University of Tokyo

About

Yasushi Ishikawa is an author at Tohoku University specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	20	522
2	Applied Physics	12	15	377
3	Business	1	1	12
4	Health Sciences	1	1	39
5	Natural Sciences	1	1	42

Yasushi Ishikawa

Publications

626

Citations

H-Index

Page 1

	Year	Citations
Malliavin calculus on the Wiener–Poisson space and its application to canonical SDE with jumps Yasushi Ishikawa, Hiroshi Kunita Stochastic Processes and their Applications Spectral TheoryWiener–poisson SpaceEngineeringIntegrable ProbabilityStochastic Processes	2006	92
On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes Seiji Samukawa, Yasushi Ishikawa, Shinya Kumagai, Japanese Journal of Applied Physics Sio 2Electron DensityElectrical EngineeringEngineeringPhysics	2001	57
Surface reactions during etching of organic low-k films by plasmas of N2 and H2 Kenji Ishikawa, Yoshikazu Yamaoka, Moritaka Nakamura, Journal of Applied Physics Chemical EngineeringH2 PlasmasEngineeringSurface ReactionsSurface Science	2006	44
Reduction of ultraviolet-radiation damage in SiO2 using pulse-time-modulated plasma and its application to charge coupled 44 device image sensor processes Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Filter DeviceEngineeringPlasma ProcessingImage SensorPulse-time-modulated Plasma	2003	42
Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes Mitsuru Okigawa, Yasushi Ishikawa, Yoshinari Ichihashi, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightEngineeringUv AbsorptionPlasma ProcessingImage Sensor	2004	39
Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge-Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa Japanese Journal of Applied Physics Ultraviolet LightShort Wavelength OpticEngineeringSilicon On InsulatorPhotovoltaics	2003	37
Optimal Control Problem Associated with Jump Processes Yasushi Ishikawa Applied Mathematics & Optimization Mathematical Control TheoryProcess ControlJump ProcessesStochastic ControlDynamic Optimization	2004	36
Asymptotic behavior of the transition density for jump type processes in small time Yasushi Ishikawa Tohoku Mathematical Journal	1994	35
Reduction of plasma-induced damage in SiO2 films during pulse-time-modulated plasma irradiation Yasushi Ishikawa, Mitsuru Okigawa, Seiji Samukawa, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringIntegrated CircuitsVacuum DeviceSilicon On Insulator	2005	29
Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process Tomohiro Kubota, Takeshi Hashimoto, Yasushi Ishikawa, Applied Physics Letters EngineeringElectron-beam LithographyNanodevicesSilicon On InsulatorSemiconductor Nanostructures	2006	21

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