Yoshinari Ichihashi

Achievement of More Than 25% Conversion Efficiency With Crystalline Silicon Heterojunction Solar Cell

K. Masuko, Masato Shigematsu, Taiki Hashiguchi et al. · IEEE Journal of Photovoltaics · 2014 · 1.2K citations

Optical Materials, Engineering, Energy Efficiency +23

Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes

Mitsuru Okigawa, Yasushi Ishikawa, Yoshinari Ichihashi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 39 citations

Ultraviolet Light, Engineering, Uv Absorption +20

Low-damage low-k etching with an environmentally friendly CF3I plasma

E. Soda, Seiichi Kondo, Shuichi Saito et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2008 · 24 citations

Materials Science, Electrical Engineering, Plasma Electronics +13

Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes

Yoshinari Ichihashi, Yasushi Ishikawa, Yuji Kato et al. · Japanese Journal of Applied Physics · 2006 · 15 citations

Plasma Etching Processes, Sio 2, Plasma Electronics +13

Generation and reduction in SiO2/Si interface state density during plasma etching processes

Yasushi Ishikawa, Yoshinari Ichihashi, Satoshi Yamasaki et al. · Journal of Applied Physics · 2008 · 14 citations

Engineering, Silicon On Insulator, Plasma Processing +20