Concepedia

Author

Yoshinari Ichihashi

Tohoku University

Also Known As

Y. Ichihashi, Yoshinari Ichihashi

17

Publications

1.4K

Citations

9

H-Index

43

Concepts

All Affiliations

Tohoku UniversitySanyo (Japan)National Institute of Advanced Industrial Science and Technology
YI

About

Yoshinari Ichihashi is an author at Tohoku University specializing in applied physics, engineering, and optoelectronics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

1.3K

2

Applied Physics

8

8

1.3K

3

Chemical Engineering

3

3

1.2K

4

Health Sciences

2

2

52

5

Chemistry

1

1

13

Yoshinari Ichihashi

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9

Publications

1.3K

Citations

9

H-Index

YearCitations

Achievement of More Than 25% Conversion Efficiency With Crystalline Silicon Heterojunction Solar Cell

K. Masuko, Masato Shigematsu, Taiki Hashiguchi,

IEEE Journal of Photovoltaics

2014

1.2K

Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes

Mitsuru Okigawa, Yasushi Ishikawa, Yoshinari Ichihashi,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

2004

39

Low-damage low-k etching with an environmentally friendly CF3I plasma

E. Soda, Seiichi Kondo, Shuichi Saito,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

2008

24

Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes

Yoshinari Ichihashi, Yasushi Ishikawa, Yuji Kato,

Japanese Journal of Applied Physics

2006

15

Generation and reduction in SiO2/Si interface state density during plasma etching processes

Yasushi Ishikawa, Yoshinari Ichihashi, Satoshi Yamasaki,

Journal of Applied Physics

2008

14

Environmentally harmonized CF3I plasma for low-damage and highly selective low-k etching

Seiji Samukawa, Yoshinari Ichihashi, Hiroto Ohtake,

Journal of Applied Physics

2008

13

UV photon-induced defect and its control in plasma etching processes

Yasushi Ishikawa, Yoshinari Ichihashi, Satoshi Yamasaki,

Journal of Applied Physics

2008

11

On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process

Butsurin Jinnai, Toshiyuki Orita, Mamoru Konishi,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

2007

10

Effect of iodotrifluoromethane plasma for reducing ultraviolet light irradiation damage in dielectric film etching processes

Yoshinari Ichihashi, Yasushi Ishikawa, Ryu Shimizu,

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

2010

10

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