Concepedia

Hisataka Hayashi

HH

Statistics

Publications

14

Citations

464

H-Index

12

Active since

1996

Affiliations

Toshiba (Japan)(Current)

Nagoya University

Association of Super-Advanced Electronics

Toshiba (South Korea)

Plasma Technology (United States)

Hisataka Hayashi is an author at Toshiba (Japan) specializing in surface science, materials science, and plasma-surface interactions.

Publications per year

1996–2019

14

Publications

14

Fabrication of Silicon-on-Nothing Structure by Substrate Engineering Using the Empty-Space-in-Silicon Formation Technique

Tsutomu Sato, Ichiro Mizushima, Shuichi Taniguchi et al. · Japanese Journal of Applied Physics · 2004 · 80 citations

, , +17

Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing

Tetsuya Tatsumi, Hisataka Hayashi, Satoshi Morishita et al. · Japanese Journal of Applied Physics · 1998 · 63 citations

, , +17

Characterization of Highly Selective SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> Etching of High-Aspect-Ratio Holes

Hisataka Hayashi, Kazuaki Kurihara, Makoto Sekine · Japanese Journal of Applied Physics · 1996 · 61 citations

, , +17

Mechanism of C4F8 dissociation in parallel-plate-type plasma

Hisataka Hayashi, Satoshi Morishita, Tetsuya Tatsumi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 51 citations

, , +13

Formation mechanism of sidewall striation in high-aspect-ratio hole etching

Mitsuhiro Omura, Jun-ichi Hashimoto, Takahiro ADACHI et al. · Japanese Journal of Applied Physics · 2019 · 41 citations

, , +17

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