Miyako Matsui

Control of surface reactions in high-performance SiO2 etching

Tomoaki Tatsumi, Miyako Matsui, Mitsuru Okigawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 117 citations

Natural Sciences, Materials Engineering, Materials Science +17

Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4

Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 116 citations

Natural Sciences, Materials Engineering, Materials Science +17

Observation of surface reaction layers formed in highly selective SiO2 etching

Miyako Matsui, Tetsuya Tatsumi, Makoto Sekine · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 76 citations

Natural Sciences, Materials Engineering, Materials Science +17

Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processing

Tomoaki Tatsumi, Yukinobu Hikosaka, Satoshi Morishita et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 72 citations

Engineering, Chemistry, Semiconductor Devices +16

Analysis of SiO2-to-Si3N4 selectivity in reactive ion etching using additional O2 gas

Miyako Matsui, Fumihiko Uchida, Masayuki Kojima et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +17