Yukinobu Hikosaka

Low Operating Voltage, Improved Breakdown Tolerance, and High Endurance in Hf_0.5Zr_0.5O₂ Ferroelectric Capacitors Achieved by Thickness Scaling Down to 4 nm for Embedded Ferroelectric Memory

Kasidit Toprasertpong, Kento Tahara, Yukinobu Hikosaka et al. · ACS Applied Materials & Interfaces · 2022 · 151 citations

Natural Sciences, Materials Engineering, Materials Science +17

Diagnostics and control of radicals in an inductively coupled etching reactor

H. Sugai, Keiji Nakamura, Yukinobu Hikosaka et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 121 citations

Natural Sciences, Materials Science, Physics +16

Free Radicals in an Inductively Coupled Etching Plasma

Yukinobu Hikosaka, Moritaka Nakamura, Hideo Sugai · Japanese Journal of Applied Physics · 1994 · 77 citations

Natural Sciences, Materials Engineering, Materials Science +16

Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processing

Tomoaki Tatsumi, Yukinobu Hikosaka, Satoshi Morishita et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 72 citations

Engineering, Chemistry, Semiconductor Devices +16

Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing

Tetsuya Tatsumi, Hisataka Hayashi, Satoshi Morishita et al. · Japanese Journal of Applied Physics · 1998 · 63 citations

Natural Sciences, Chemistry, Physics +17