Eric S. Ainley - Concepedia

Author

Eric S. Ainley

Motorola (United States)

Also Known As

E. Ainley, E. S. Ainley, E.S. Ainley, Eric Ainley, Eric S. Ainley

Publications

304

Citations

H-Index

Concepts

All Affiliations

Motorola (United States)The University of Texas at Austin

About

Eric S. Ainley is an author at Motorola (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	271
2	Applied Physics	6	6	165
3	Electrical Engineering	2	2	56
4	Materials Engineering	2	2	56
5	Chemistry	1	1	52

Eric S. Ainley

Publications

271

Citations

H-Index

Page 1

	Year	Citations
Template fabrication schemes for step and flash imprint lithography T. C. Bailey, Douglas J. Resnick, David P. Mancini, Microelectronic Engineering Materials ScienceEngineeringBeam LithographyMicrofabricationFabrication Technique	2002	106
Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates David P. Mancini, K. A. Gehoski, Eric S. Ainley, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Direct PatterningEngineeringElectron-beam LithographyPattern TransferChemistry	2002	52
High-resolution templates for step and flash imprint lithography Douglas J. Resnick, William J. Dauksher, David P. Mancini, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyComputer-aided DesignBeam Lithography	2002	43
Nano-imprint lithography: Templates, imprinting and wafer pattern transfer William J. Dauksher, Ngoc Van Le, Eric S. Ainley, Microelectronic Engineering Materials ScienceNano-imprint LithographyEngineeringNanomaterialsNanotechnology	2006	30
Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications Eric S. Ainley, Kevin J. Nordquist, Douglas J. Resnick, Microelectronic Engineering EngineeringBeam LithographyElectron-beam LithographyTarget FabricationApplied Physics	1999	14
Direct pattern transfer for sub-45nm features using nanoimprint lithography Ngoc Van Le, William J. Dauksher, K. A. Gehoski, Microelectronic Engineering Direct Pattern TransferEngineeringBeam LithographyMicrofabricationApplied Physics	2006	13
Comparison of negative resists for 100 nm electron-beam direct write and mask making applications Kevin J. Nordquist, Douglas J. Resnick, Eric S. Ainley Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena New Negative ToneEngineeringElectron-beam LithographyVacuum DeviceElectron Optic	1998	13

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