Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications - Concepedia

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Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications

14

Citations

2

References

1999

Year

Eric S. Ainley, Kevin J. Nordquist, Douglas J. Resnick, D. W. Carr, R. C. Tiberio

Microelectronic Engineering

EngineeringBeam LithographyElectron-beam LithographyTarget FabricationApplied PhysicsAmplified Negative ResistProcess OptimizationElectron Beam ExposureElectron OpticMicroelectronics

References

	Year	Citations

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