Rich Wise - Concepedia

Author

Rich Wise

IBM (United States)

Also Known As

R. Wise, Rich S. Wise, Rich Wise

Publications

534

Citations

H-Index

Concepts

All Affiliations

IBM (United States)Lam Research (United States)IBM Research - Thomas J. Watson Research Center IMEC Advanced Micro Devices (Canada)

About

Rich Wise is an author at IBM (United States) specializing in engineering, microelectronics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	479
2	Applied Physics	7	7	479
3	Electrical Engineering	6	6	363
4	Computer Engineering	5	5	306
5	Materials Engineering	1	1	15

Rich Wise

Publications

491

Citations

H-Index

Page 1

	Year	Citations
Predicting synergy in atomic layer etching Keren J. Kanarik, Samantha Tan, Wenbing Yang, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSurface CharacterizationEngineeringTunneling MicroscopyPhysics	2017	116
High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography P. Agnello, T. Ivers, C. Warm, EngineeringVlsi DesignEnhanced StrainPorous Low-k BeolIntegrated Circuits	2006	115
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL P. Chang, C. Ortolland, David Fried, High-performance Soi TechnologyEngineeringVlsi DesignComputer ArchitectureInterconnect (Integrated Circuits)	2012	89
High-Performance High-¿/Metal Gates for 45nm CMOS and Beyond with Gate-First Processing M. Chudzik, B. Doris, R. Mo, EngineeringVlsi DesignGate-first ProcessingIntegrated CircuitsSemiconductor Device	2007	75
Plasma-etching processes for ULSI semiconductor circuits M. Armacost, P.D. Hoh, Rich Wise, IBM Journal of Research and Development EngineeringElectron-beam LithographyOptoelectronic DevicesIntegrated CircuitsSelectivity Requirements	1999	57
Breaking stochastic tradeoffs with a dry deposited and dry developed EUV photoresist system Rich Wise EngineeringElectron-beam LithographyImage SensorPhotoelectric SensorImage Analysis	2021	15
Improving scanner wafer alignment performance by target optimization Philippe Leray, Christiane Jehoul, Robert Socha, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2016	12
Integrated approach to improving local CD uniformity in EUV patterning Andrew Liang, Jan Hermans, Timothy H. Tran, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyExtreme UltravioletWafer Scale Processing	2017	12

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