Rich Wise

Predicting synergy in atomic layer etching

Keren J. Kanarik, Samantha Tan, Wenbing Yang et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 116 citations · Full text

Materials Science, Surface Characterization, Engineering +13

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Vlsi Design, Enhanced Strain +21

22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL

P. Chang, C. Ortolland, David Fried et al. · 2012 · 89 citations

High-performance Soi Technology, Engineering, Vlsi Design +16

High-Performance High-¿/Metal Gates for 45nm CMOS and Beyond with Gate-First Processing

M. Chudzik, B. Doris, R. Mo et al. · 2007 · 75 citations

Engineering, Vlsi Design, Gate-first Processing +16

Plasma-etching processes for ULSI semiconductor circuits

M. Armacost, P.D. Hoh, Rich Wise et al. · IBM Journal of Research and Development · 1999 · 57 citations

Engineering, Electron-beam Lithography, Optoelectronic Devices +17