T. Ivers

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Vlsi Design, Enhanced Strain +21

High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell

E. Leobandung, H. Nayakama, D. Mocuta et al. · 2005 · 65 citations

Electrical Engineering, Engineering, Vlsi Design +15

High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL

W.-H. Lee, Anya M. Waite, H. Nii et al. · 2006 · 55 citations

Engineering, Vlsi Design, Integrated Circuits +19

Observation of wall stabilization and active control of low-<i>n</i> magnetohydrodynamic instabilities in a tokamak

T. Ivers, E. Eisner, A. M. Garofalo et al. · Physics of Plasmas · 1996 · 41 citations

Engineering, Plasma Science, Plasma Physics +17

Phosphorylcholine or heparin coating for pediatric extracorporeal circulation causes similar biologic effects in neonates and infants

Andreas Böning, Jens Scheewe, T. Ivers et al. · Journal of Thoracic and Cardiovascular Surgery · 2004 · 27 citations · Full text

Similar Biologic Effects, Neonatology, Heparin Coating +5