H. Nii

Integration and optimization of embedded-sige, compressive and tensile stressed liner films, and stress memorization in advanced SOI CMOS technologies

L.T. Su, John Pellerin, Shih-Fen Huang et al. · 2005 · 63 citations

Engineering, Computer Engineering, Electrical Engineering +17

A novel lateral bipolar transistor with 67 GHz f/sub max/ on thin-film SOI for RF analog applications

H. Nii, Takashi Yamada, K. Inoh et al. · IEEE Transactions on Electron Devices · 2000 · 59 citations

Engineering, Electrical Engineering, Materials Science +15

High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL

W.-H. Lee, Anya M. Waite, H. Nii et al. · 2006 · 55 citations

Engineering, Computer Engineering, Electrical Engineering +17

43 Gb/s full-rate-clock 16:1 multiplexer and 1:16 demultiplexer with SFI-5 interface in SiGe BiCMOS technology

A. Koyama, Takashi Harada, Hiroyuki Yamashita et al. · 2003 · 32 citations

Engineering, Computer Engineering, Electrical Engineering +17

P-MOSFET's with ultra-shallow solid-phase-diffused drain structure produced by diffusion from BSG gate-sidewall

M. Saito, T. Yoshitomi, Hisashi Hara et al. · IEEE Transactions on Electron Devices · 1993 · 24 citations

Engineering, Electrical Engineering, Materials Science +17