R. Mo

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 113 citations

Engineering, Computer Engineering, Electrical Engineering +16

High performance CMOS fabricated on hybrid substrate with different crystal orientations

Min Yang, M. Ieong, L. Shi et al. · 2004 · 90 citations

Engineering, Electrical Engineering, Microelectronics +14

High performance and low power transistors integrated in 65nm bulk CMOS technology

Zuying Luo, An Steegen, M. Eller et al. · 2005 · 81 citations

Engineering, Electrical Engineering, Low-power Design +16

High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing

M. Chudzik, B. Doris, R. Mo et al. · 2007 · 77 citations

Engineering, Computer Engineering, Electrical Engineering +17

FINFET technology featuring high mobility SiGe channel for 10nm and beyond

Dechao Guo, G. Karve, Gen Tsutsui et al. · 2016 · 65 citations

Engineering, Computer Engineering, Electrical Engineering +14