Materials science forum · 2018 · 15 citations · 7 references
EngineeringElectrical EngineeringElectronic MaterialsMicroelectronicsSemiconductor DevicesDevice CharacterizationDevice ReliabilitySemiconductor Device MaterialsSemiconductor ReliabilityWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsCmos ReliabilityGate Oxide DegradationGate Oxide ReliabilityPower MosfetsSilicon Carbide (Sic) MaterialsSilicon Carbide Power DevicesSwitching LossesSwitching-induced Losses
This paper presents the performance, reliability and ruggedness characterization of 1200V, 80mΩ rated SiC planar gate MOSFETs, fabricated in a high volume, 150mm silicon CMOS foundry. The devices showed a specific on-resistance of 5.1 mΩ.cm 2 at room temperature, increasing to 7.5 mΩ.cm 2 at 175 °C. Total switching losses were less than 300μJ (V DD = 800V, I D = 20A). The devices showed excellent gate oxide reliability with V TH shifts under 0.2V for extended HTGB stress testing at 175 °C for up to 5500 hours (V GS = 25V) and 2500 hours (V GS = -10V). Ruggedness performance such as unclamped inductive load switching and short circuit capability are also discussed.
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SiC MOSFET design considerations for reliable high voltage operation
P. A. Losee, Alexander Bolotnikov, Lihua Yu et al. · 2017 · 38 citations
Engineering, Electrical Engineering, Electronic Materials +12
Time Dependent Dielectric Breakdown in High Quality SiC MOS Capacitors
Z. Chbili, Kin P. Cheung, J. P. Campbell et al. · Materials science forum · 2016 · 31 citations · Full text