J. P. Campbell

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Publications

Citations

1.6K

H-Index

Active since

1969

Affiliations

National Institute of Standards and Technology(Current)

Pennsylvania State University

Theiss Research

Texas Instruments (United States)

Taiwan Semiconductor Manufacturing Company (Taiwan)

J. P. Campbell is an author at National Institute of Standards and Technology specializing in engineering, microelectronics, and electrical engineering.

ORCID

Top concepts

EngineeringMicroelectronicsApplied PhysicsElectrical EngineeringPhysicsNanoelectronicsCondensed Matter PhysicsSpintronicsDefect ToleranceCrystalline Defects

Publications per year

1969–2022

Publications

Atomic-scale defects involved in the negative-bias temperature instability

J. P. Campbell, Patrick M. Lenahan, Corey J. Cochrane et al. · IEEE Transactions on Device and Materials Reliability · 2007 · 107 citations

Engineering, Defect Tolerance, Semiconductor Device +17

Near Fields of Truncated-Gaussian Apertures*

J. P. Campbell, L. G. DeShazer · Journal of the Optical Society of America · 1969 · 90 citations

Integral Geometry, Truncated-gaussian Apertures, Kirchhoff Diffraction Integral +12

Modeling Early Breakdown Failures of Gate Oxide in SiC Power MOSFETs

Z. Chbili, Asahiko Matsuda, Jaafar Chbili et al. · IEEE Transactions on Electron Devices · 2016 · 88 citations

Engineering, Root Cause, Sic Power Mosfets +19

Density of states of Pb1 Si/SiO2 interface trap centers

J. P. Campbell, Patrick M. Lenahan · Applied Physics Letters · 2002 · 86 citations

Materials Science, Defect Tolerance, Spintronics +14

A Simple Series Resistance Extraction Methodology for Advanced CMOS Devices

J. P. Campbell, Kin P. Cheung, John S. Suehle et al. · IEEE Electron Device Letters · 2011 · 86 citations

Electrical Engineering, Engineering, Resistor +9

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