Simulating the impact of pattern-dependent poly-CD variation on circuit performance

B.E. Stine, Duane S. Boning, J.E. Chung, Dennis Ciplickas, J.K. Kibarian

IEEE Transactions on Semiconductor Manufacturing · 1998 · 23 citations · 16 references

Concepts

Abstract

In this paper, we present a methodology for simulating the impact of within-die (die-level) polysilicon critical dimension (poly-CD) variation on circuit performance. The methodology is illustrated on a 0.25 /spl mu/m 64/spl times/8 SRAM macrocell layout. For this example, the impact as measured through signal skew is found to be significant and strongly dependent on the input address of the SRAM cell.

References

16