Process Variation Analysis is a methodological framework within integrated circuit and MEMS co-design that systematically characterizes and quantifies manufacturing-induced deviations in device performance parameters due to inherent variability in semiconductor fabrication processes.
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50.8K
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3.8K
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742
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Publications per year
2017–2026
172
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1.4K
1–5 of 1.4K
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3.8K
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1–5 of 3.8K
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742
Intel (United States)
Santa Clara, United States
31 h-index
146 publications
10.4K citations
IBM (United States)
Armonk, United States
30 h-index
265 publications
12.1K citations
University of Michigan
Ann Arbor, United States
28 h-index
141 publications
9.4K citations
IBM Research - Austin
Austin, United States
26 h-index
96 publications
7.4K citations
Purdue University West Lafayette
West Lafayette, United States
23 h-index
99 publications
5.6K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
22 h-index
91 publications
3.2K citations
Carnegie Mellon University
Pittsburgh, United States
21 h-index
75 publications
3.1K citations
University of California, Berkeley
Berkeley, United States
20 h-index
107 publications
5.3K citations
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Venues
- IEEE Transactions on Semiconductor Manufacturing
71 publications · 3K citations
30
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- IEEE Transactions on Electron Devices
50 publications · 2.8K citations
28
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- IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
56 publications · 2.3K citations
27
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- IEEE Transactions on Very Large Scale Integration (VLSI) Systems
39 publications · 1.6K citations
22
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- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
51 publications · 1.1K citations
20
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