2006 · 65 citations · 7 references
EngineeringElectrical EngineeringCircuit TheoryMicroelectronicsMicrowave EngineeringDevice CharacterizationDevice ScalingHigh-frequency Semiconductor DevicesIntegrated Circuit DesignMicrowave Integrated CircuitsRadio-frequency Integrated CircuitsDevice Scaling EffectsFin DesignFin Field-effect TransistorsFin StructureFin Thickness Effects
This work analyzes the radio frequency (RF) performance of 60-nm gate length finFETs, for which the DC behavior exhibits reduced SCE. The RF analysis is carried out as a function of the gate length as well as the fin width (W <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">fin</sub> ). Cut off frequencies (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> , f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> ) on the order of 100 GHz are reported for the first time. It is shown that W <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">fin</sub> has a large impact on those frequencies, due mainly to its effect on the access resistances. Nevertheless, it is also demonstrated that using optimized layout geometry, f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> values close to 170 GHz are to be expected
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FinFET analogue characterization from DC to 110GHz
Dimitri Lederer, Valeriya Kilchytska, Tamara Rudenko et al. · Solid-State Electronics · 2005 · 94 citations