The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source - Concepedia

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The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

DOI Full Paper Access

91

Citations

7

References

2001

Year

Henri Jansen, M. de Boer, H. Wensink, B. Kloeck, M. Elwenspoek

Microelectronics Journal

References

	Year	Citations

Page 1