The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

Henri Jansen, M. de Boer, H. Wensink, B. Kloeck

Microelectronics Journal · 2001 · 92 citations · 7 references

DOIFull text

Open access

Concepts

References

7