S. Tachi - Concepedia

Author

S. Tachi

Also Known As

S Tachi, S. Tachi, Shin'ichi Tachi, Shin'ichi Tachi Shin'ichi Tachi, Shin-ichi Tachi, Shinichi TACHI, Shinichi Tachi, Shinichi Tachi Shinichi Tachi, Shin’ichi Tachi

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)University of Houston

About

S. Tachi is an author at Hitachi (Japan) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	16	20	1K
2	Applied Physics	15	18	993
3	Chemical Engineering	5	5	241
4	Natural Sciences	2	2	46
5	Education	1	1	17

S. Tachi

Publications

Citations

H-Index

Page 1

	Year	Citations
Low-temperature reactive ion etching and microwave plasma etching of silicon S. Tachi, Kazunori Tsujimoto, Sadayuki Okudaira Applied Physics Letters Materials ScienceElectrical EngineeringEngineeringElectron-beam LithographyMicrofabrication	1988	324
Low-temperature dry etching S. Tachi, Kazunori Tsujimoto, Shin Arai, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringPlasma ProcessingHighly Selective AnisotropicReactive IonPlasma Electronics	1991	148
Chemical sputtering of silicon by F+, Cl+, and Br+ ions: Reactive spot model for reactive ion etching S. Tachi, Sadayuki Okudaira Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringEv Energy RangeIntegrated CircuitsChemistrySilicon On Insulator	1986	104
Low-energy mass-separated ion beam deposition of materials Takeshi Tokuyama, Kunihiro Yagi, Kiyoshi Miyake, Nuclear Instruments and Methods Materials EngineeringMaterials ScienceIon ImplantationEngineeringMicrofabrication	1981	55
Deposition in Dry-Etching Gas Plasmas Shin Arai, Kazunori Tsujimoto, S. Tachi Japanese Journal of Applied Physics EngineeringChemistryPlasma ProcessingChemical EngineeringPolymer Deposition	1992	44
Low-Temperature Microwave Plasma Etching of Crystalline Silicon Kazunori Tsujimoto, Sadayuki Okudaira, S. Tachi Japanese Journal of Applied Physics Materials ScienceElectrical EngineeringCrystalline SiliconEngineeringPhysics	1991	38
Chemical sputtering yields of silicon resulting from F+, CF<i>n</i>+ (<i>n</i> = 1,2,3) ion bombardment Kiyoshi Miyake, S. Tachi, Kunihiro Yagi, Journal of Applied Physics EngineeringIon Beam InstrumentationVacuum DeviceChemistrySilicon On Insulator	1982	36
Chemical and Physical Roles of Individual Reactive Ions in Si Dry Etching S. Tachi, Kiyoshi Miyake, Takeshi Tokuyama Japanese Journal of Applied Physics Materials ScienceSi Dry EtchingChemical EngineeringIncident Ion EnergyPhysical Roles	1982	36
Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon M. Tamura, S. Shukuri, S. Tachi, Japanese Journal of Applied Physics Materials ScienceBeam DiameterElectrical EngineeringIon ImplantationEngineering	1983	34
Surface stoichiometry, structure, and chemisorption on silicon nitride studied by direct recoiling, x-ray photoelectron spectroscopy, and Auger electron spectroscopy Yang-Sun Jo, J. Schultz, S. Tachi, Journal of Applied Physics EngineeringSurface StoichiometryChemistrySilicon On InsulatorDirect Recoiling	1986	29

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