Kiyoshi Miyake - Concepedia

Author

Kiyoshi Miyake

Hitachi (Japan)

Also Known As

Kiyoshi MIYAKE, Kiyoshi Miyake, Miyake Kiyoshi

Publications

920

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)Saitama University Osaka Prefecture University Tohoku University NTT (Japan)

About

Kiyoshi Miyake is an author at Hitachi (Japan) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	28	765
2	Applied Physics	15	25	713
3	Chemical Engineering	7	7	229
4	Chemistry	5	5	106
5	Natural Sciences	2	2	48

Kiyoshi Miyake

Publications

821

Citations

H-Index

Page 1

	Year	Citations
Low Temperature Oxidation of Silicon in a Microwave‐Discharged Oxygen Plasma Shin’ichiro Kimura, Eiichi Murakami, Kiyoshi Miyake, Journal of The Electrochemical Society Electrical EngineeringChemical EngineeringEngineeringPlasma ElectronicsLow Temperature Oxidation	1985	79
Photovoltaic properties of ion-beam synthesized β-FeSi2/n-Si heterojunctions Yoshihito Maeda, Kenji Umezawa, Yoshikazu Hayashi, Thin Solid Films SemiconductorsSemiconductor TechnologyElectrical EngineeringEngineeringPhotovoltaic Properties	2001	55
Low-energy mass-separated ion beam deposition of materials Takeshi Tokuyama, Kunihiro Yagi, Kiyoshi Miyake, Nuclear Instruments and Methods Materials EngineeringMaterials ScienceIon ImplantationEngineeringMicrofabrication	1981	55
Formation of iron film by ion beam deposition Kiyoshi Miyake, Kenya Ohashi, Hiromasa Takahashi, Surface and Coatings Technology Materials ScienceIon ImplantationEngineeringCorrosionApplied Physics	1994	49
Germanium and silicon ion beam deposition Kiyoshi Miyake, Takeshi Tokuyama Thin Solid Films Ion BeamIon ImplantationApplied PhysicsPhysics	1982	43
Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition Jae‐Won Lim, Yukio Ishikawa, Kiyoshi Miyake, MATERIALS TRANSACTIONS Cu FilmsEngineeringThin Film Process TechnologyVacuum DeviceChemical Deposition	2002	41
Microwave plasma stream transport system for low temperature plasma oxidation Kiyoshi Miyake, Shin’ichiro Kimura, T. Warabisako, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Electrical EngineeringChemical EngineeringEngineeringPlasma ElectronicsPlasma Oxidation	1984	39
Chemical sputtering yields of silicon resulting from F+, CF<i>n</i>+ (<i>n</i> = 1,2,3) ion bombardment Kiyoshi Miyake, S. Tachi, Kunihiro Yagi, Journal of Applied Physics EngineeringIon Beam InstrumentationVacuum DeviceChemistrySilicon On Insulator	1982	36
Chemical and Physical Roles of Individual Reactive Ions in Si Dry Etching S. Tachi, Kiyoshi Miyake, Takeshi Tokuyama Japanese Journal of Applied Physics Materials ScienceSi Dry EtchingChemical EngineeringIncident Ion EnergyPhysical Roles	1982	36
Raman spectroscopic study of ion-beam synthesized polycrystalline β-FeSi2 on Si(100) Yoshihito Maeda, Kenji Umezawa, Yoshikazu Hayashi, Thin Solid Films Materials ScienceEngineeringNanotechnologyApplied PhysicsSolid-state Chemistry	2001	32

Page 1