Eiichi Murakami

Practical nitric oxide measurement employing a nitric oxide-selective electrode

Koji Ichimori, H. Ishida, Masami Fukahori et al. · Review of Scientific Instruments · 1994 · 182 citations

Pharmacy, Bioengineering, Biomedical Engineering +9

A New TDDB Degradation Model Based on Cu Ion Drift in Cu Interconnect Dielectrics

N. Suzumura, S. Yamamoto, Daisuke Kodama et al. · 2006 · 107 citations

Engineering, Electrical Engineering, Materials Science +17

Low Temperature Oxidation of Silicon in a Microwave‐Discharged Oxygen Plasma

Shin’ichiro Kimura, Eiichi Murakami, Kiyoshi Miyake et al. · Journal of The Electrochemical Society · 1985 · 79 citations

Natural Sciences, Materials Science, Physics +17

High hole mobility in strained Ge channel of modulation-doped p-Si0.5Ge0.5/Ge/Si1−xGex heterostructure

Masanobu Miyao, Eiichi Murakami, Hiroyuki Etoh et al. · Journal of Crystal Growth · 1991 · 74 citations

Engineering, Materials Engineering, Materials Science +16

Effect of nitrogen at SiO2/Si interface on reliability issues—negative-bias-temperature instability and Fowler–Nordheim-stress degradation

Keiko Kushida-Abdelghafar, Kikuo Watanabe, Jiro Ushio et al. · Applied Physics Letters · 2002 · 70 citations

Engineering, Electrical Engineering, Materials Science +17