Etch Selectivity

Etch Selectivity is the ratio of etch rates between two materials, serving as a metric that quantifies the relative removal rate of a target material compared to a second material under the same etching conditions, thereby distinguishing its efficacy in selectively patterning thin films while preserving underlying or adjacent layers in processes such as bulk micromachining and lithography.

445

Publications

15.1K

Citations

1.8K

Authors

353

Institutions

Publications per year

2017–2026

57

Authors

1.8K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    11 publications · 466 citations

    11

    h-index

  2. GY
    Geun Young Yeom

    Sungkyunkwan University, South Korea

    9 publications · 167 citations

    9

    h-index

  3. NL
    Nae‐Eung Lee

    Sungkyunkwan University, South Korea

    8 publications · 169 citations

    8

    h-index

  4. GY
    G.Y. Yeom

    Sungkyunkwan University, South Korea

    8 publications · 189 citations

    8

    h-index

  5. GS
    G. S. Oehrlein

    University of Maryland, College Park, United States

    7 publications · 635 citations

    7

    h-index

1–5 of 1.8K

Venues

  1. 27

    h-index

  2. Journal of The Electrochemical Society

    JES · 55 publications · 1.8K citations

    26

    h-index

  3. 25

    h-index

  4. Applied Physics Letters

    35 publications · 1.7K citations

    23

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 33 publications · 1K citations

    18

    h-index

1–5