Etch Selectivity
Etch Selectivity is the ratio of etch rates between two materials, serving as a metric that quantifies the relative removal rate of a target material compared to a second material under the same etching conditions, thereby distinguishing its efficacy in selectively patterning thin films while preserving underlying or adjacent layers in processes such as bulk micromachining and lithography.
445
Publications
15.1K
Citations
1.8K
Authors
353
Institutions
Publications per year
2017–2026
57
Variants
Etch Selectivity Ratio
445
G. DeSalvo, Wen Feng Tseng, J. Comas · Journal of The Electrochemical Society · 1992 · 168 citations
1–5 of 445
1.8K
11
h-index
9
h-index
8
h-index
8
h-index
7
h-index
1–5 of 1.8K
353
Sungkyunkwan University
Seoul, South Korea
16 h-index
128 publications
2.6K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
15 h-index
51 publications
2.3K citations
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
13 h-index
52 publications
1.3K citations
CEA Grenoble
Grenoble, France
12 h-index
43 publications
1.1K citations
Sandia National Laboratories
Albuquerque, United States
11 h-index
24 publications
781 citations
Samsung (South Korea)
Seoul, South Korea
11 h-index
39 publications
1.3K citations
Laboratoire d'Électronique des Technologies de l'Information
Grenoble, France
10 h-index
38 publications
863 citations
AT&T (United States)
Bedminster, United States
10 h-index
39 publications
727 citations
1–8 of 353
68 publications · 2.5K citations
27
h-index
JES · 55 publications · 1.8K citations
26
h-index
48 publications · 1.5K citations
25
h-index
35 publications · 1.7K citations
23
h-index
JJAP · 33 publications · 1K citations
18
h-index
1–5