Concepedia

Y. Zhang

YZ

Statistics

Publications

5

Citations

472

H-Index

5

Active since

1994

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Y. Zhang is an author at IBM Research - Thomas J. Watson Research Center specializing in plasma physics, plasma-surface interactions, and semiconductor devices.

Publications per year

1994–1994

5

Publications

5

Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3

G. S. Oehrlein, Y. Zhang, D. Vender et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 189 citations

, , +14

Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3

G. S. Oehrlein, Y. Zhang, D. Vender et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 152 citations

, , +17

Fluorocarbon high density plasma. V. Influence of aspect ratio on the etch rate of silicon dioxide in an electron cyclotron resonance plasma

O. Joubert, G. S. Oehrlein, Y. Zhang · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 64 citations

, , +17

Investigation of selective SiO2-to-Si etching in an inductively coupled high-density plasma using fluorocarbon gases

F. H. Bell, O. Joubert, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 48 citations

, , +17

Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas

O. Joubert, G. S. Oehrlein, M. Surendra et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 19 citations

, , +4

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