Effects of various Co/TiN and Co/Ti layer stacks and the salicide rapid thermal process conditions on cobalt silicide formation

Study of cobalt-disilicide formation from cobalt monosilicide

A. Appelbaum, R. V. Knoell, S. P. Murarka · Journal of Applied Physics · 1985 · 95 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Self-aligned CoSi/sub 2/ for 0.18 μm and below

Karen Maex, A. Lauwers, Paul R. Besser et al. · IEEE Transactions on Electron Devices · 1999 · 56 citations

Engineering, Electrical Engineering, Materials Science +12

Influence of Ti on CoSi2 nucleation

Christophe Detavernier, R.L. Van Meirhaeghe, F. Cardon et al. · Applied Physics Letters · 2000 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +14

Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system

Dong Kyun Sohn, Ji‐Soo Park, Byung Hak Lee et al. · Applied Physics Letters · 1998 · 30 citations

Engineering, Materials Engineering, Materials Science +17

The Influence of Capping Layer Type on Cobalt Salicide Formation in Films and Narrow Lines

Paul R. Besser, A. Lauwers, N. Roelandts et al. · MRS Proceedings · 1998 · 18 citations

Natural Sciences, Materials Engineering, Materials Science +11