14
Publications
593
Citations
11
H-Index
1983
Active since
R. V. Knoell is an author at AT&T (United States) specializing in applied physics, materials science, and engineering.
Top concepts
Applied PhysicsEngineeringMaterial ScienceMaterials EngineeringPhysicsSurface ScienceCrystalline DefectsThin FilmsMicroelectronicsElectrical Engineering
Publications per year
1983–1991
14
14
Ion-beam-induced crystallization and amorphization of silicon
R. G. Elliman, J. S. Williams, W. L. Brown et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1987 · 173 citations
Ion Implantation, Ion-beam-induced Crystallization, Applied Physics +2
Nitrogen, oxygen, and argon incorporation during reactive sputter deposition of titanium nitride
Doug Williams, F. A. Baiocchi, R. C. Beairsto et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 46 citations
Materials Science, Materials Engineering, Chemical Engineering +15
A. Leiberich, D. M. Maher, R. V. Knoell et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1987 · 42 citations
Rows per page
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