Concepedia

A. Appelbaum

AA

17

Publications

588

Citations

14

H-Index

1976

Active since

Affiliations

AT&T (United States)(Current)

Rockwell Automation (United States)

Technion – Israel Institute of Technology

A. Appelbaum is an author at AT&T (United States) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsSurface ScienceChemistryPhysicsCrystalline DefectsMaterials EngineeringLaser Applications

Publications per year

1976–1991

17

Publications

17

Laser direct-write metallization in thin palladium acetate films

M. E. Gross, A. Appelbaum, P.K. Gallagher · Journal of Applied Physics · 1987 · 97 citations

Materials Science, Advanced Laser Processing, Engineering +15

Study of cobalt-disilicide formation from cobalt monosilicide

A. Appelbaum, R. V. Knoell, S. P. Murarka · Journal of Applied Physics · 1985 · 95 citations · Full text

Materials Science, Inorganic Chemistry, Semiconductors +13

Excimer laser-induced deposition of InP: Crystallographic and mechanistic studies

V. M. Donnelly, D. Brasen, A. Appelbaum et al. · Journal of Applied Physics · 1985 · 65 citations

Optical Materials, Engineering, Crystal Growth Technology +20

ArF excimer-laser-stimulated growth of polycrystalline GaAs thin films

V. M. Donnelly, V. R. McCrary, A. Appelbaum et al. · Journal of Applied Physics · 1987 · 47 citations

Optical Materials, Engineering, Laser Applications +17

Phase separation and layer sequence reversal during silicide formation with Ni-Cr alloys and Ni-Cr bilayers

A. Appelbaum, M. Eizenberg, R. Brener · Journal of Applied Physics · 1984 · 36 citations

Engineering, Solid-state Reactions, Layer Sequence Reversal +20

Rows per page

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