Concepedia

V. M. Donnelly

VM

33

Publications

1.5K

Citations

23

H-Index

1982

Active since

Affiliations

AT&T (United States)(Current)

Nokia (United States)

V. M. Donnelly is an author at AT&T (United States) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceChemistryLaser ApplicationsOptoelectronicsOptical PropertiesPhysicsSurface ScienceOptical Materials

Publications per year

1982–1998

33

Publications

33

Temperature dependence of the near-infrared refractive index of silicon, gallium arsenide, and indium phosphide

J. A. McCaulley, V. M. Donnelly, Matthew Vernon et al. · Physical review. B, Condensed matter · 1994 · 156 citations

Optical Materials, Engineering, Optical Glass +21

Infrared-laser interferometric thermometry: A nonintrusive technique for measuring semiconductor wafer temperatures

V. M. Donnelly, J. A. McCaulley · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 101 citations

Short Wavelength Optic, Optical Materials, Engineering +25

Products of thermal decomposition of triethylgallium and trimethylgallium adsorbed on Ga-stabilized GaAs(100)

V. M. Donnelly, J. A. McCaulley · Surface Science · 1990 · 80 citations

Materials Engineering, Materials Science, Engineering +3

Laser-induced decomposition of triethylgallium and trimethylgallium adsorbed on gallium arsenide(100)

J. A. McCaulley, V. R. McCrary, V. M. Donnelly · The Journal of Physical Chemistry · 1989 · 74 citations

Chemical Kinetics, Chemical Engineering, Engineering +12

Development of laser diagnostic probes for chemical vapor deposition of InP/InGaAsP epitaxial layers

V. M. Donnelly, R. F. Karlicek · Journal of Applied Physics · 1982 · 72 citations

Engineering, Cvd Growth Reactor, Chemistry +19

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