R. C. Beairsto is an author at AT&T (United States) specializing in applied physics, engineering, and nanoelectronics.
Top concepts
EngineeringApplied PhysicsPhysicsCorrosionEducationThin FilmsCalibrationMeasurementSemiconductorsInstrumentation
Publications per year
1967–1987
2
2
Nitrogen, oxygen, and argon incorporation during reactive sputter deposition of titanium nitride
Doug Williams, F. A. Baiocchi, R. C. Beairsto et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 46 citations
Materials Science, Materials Engineering, Chemical Engineering +15
Rows per page
1–2 of 2