O. Fursenko - Concepedia

Author

O. Fursenko

Institut für Solartechnologien (Germany)

Also Known As

O Fursenko, O. Fursenko, O. V. Fursenko, O.V Fursenko, O.V. Fursenko, OV Fursenko

Publications

832

Citations

H-Index

Concepts

All Affiliations

Institut für Solartechnologien (Germany)Leibniz Institute for High Performance Microelectronics Technical University of Applied Sciences Wildau

About

O. Fursenko is an author at Institut für Solartechnologien (Germany) specializing in engineering, microelectronics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	15	654
2	Applied Physics	8	8	346
3	Computer Engineering	5	5	293
4	Education	1	1	13
5	Chemistry	1	1	14

O. Fursenko

Publications

732

Citations

H-Index

Page 1

	Year	Citations
SiGe HBT technology with f<inf>T</inf>/f<inf>max</inf> of 300GHz/500GHz and 2.0 ps CML gate delay B. Heinemann, R. Barth, D. Bolze, Low-power ElectronicsElectrical EngineeringEngineeringVlsi DesignHigh-speed Electronics	2010	163
SiGe HBT with fx/fmax of 505 GHz/720 GHz B. Heinemann, H. Rücker, R. Barth, Electrical EngineeringSige HbtEngineeringVlsi DesignMillimeter Wave Technology	2016	147
Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates Mindaugas Lukosius, J. Da̧browski, Julia Kitzmann, ACS Applied Materials & Interfaces	2016	66
Optical properties and band gap characterization of high dielectric constant oxides O. Fursenko, J. Bauer, Piotr Dudek, Thin Solid Films Materials ScienceIi-vi SemiconductorOptical MaterialsEngineeringGap Characterization	2011	55
A complementary BiCMOS technology with high speed npn and pnp SiGe:C HBTs B. Heinemann, R. Barth, D. Bolze, Low-power ElectronicsElectrical EngineeringHigh Speed NpnEngineeringComplementary Bicmos Technology	2004	48
A flexible, low-cost, high performance SiGe:C BiCMOS process with a one-mask HBT module D. Knoll, K.‐E. Ehwald, B. Heinemann, Electrical EngineeringHbt DevicesEngineeringVlsi DesignDevice Integration	2003	41
Monolithically Integrated 25Gbit/sec Receiver for 1.55μm in Photonic BiCMOS Technology D. Knoll, Stefan Lischke, Lars Zimmermann, Optical Fiber Communication Conference PhotonicsElectrical EngineeringEngineeringDevice IntegrationIntegrated Photonics	2014	33
Dielectric constant and leakage of BaZrO3 films Grzegorz Łupina, J. Da̧browski, Piotr Dudek, Applied Physics Letters Materials ScienceMaterials EngineeringDielectric PropertiesOptical MaterialsDielectric Constant	2009	30
Through silicon via profile metrology of Bosch etching process based on spectroscopic reflectometry O. Fursenko, J. Bauer, S. Marschmeyer, Microelectronic Engineering EngineeringMicrofabricationOptical PropertiesProfile MetrologyApplied Physics	2015	27
SiGe BiCMOS Technology with 3.0 ps Gate Delay H. Rücker, O. Fursenko, T. Grabolla, Electrical EngineeringEngineeringVlsi DesignEmitter AreaHigh-frequency Device	2007	24

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