Dong Kyun Sohn

A 7nm CMOS technology platform for mobile and high performance compute application

B. Jagannathan, Akihisa Ogino, D. Jaeger et al. · 2017 · 60 citations

Engineering, Computer Engineering, Electrical Engineering +14

Impact of aggressive fin width scaling on FinFET device characteristics

Xiaoli He, Jody Fronheiser, Pei Zhao et al. · 2017 · 55 citations

Engineering, Computer Engineering, Electrical Engineering +17

Determination of Raman Phonon Strain Shift Coefficient of Strained Silicon and Strained SiGe

Lydia Helena Wong, C.C. Wong, J. P. Liu et al. · Japanese Journal of Applied Physics · 2005 · 51 citations

Engineering, Materials Engineering, Materials Science +17

14nm FinFET technology for analog and RF applications

Jagar Singh, A. Bousquet, J. Ciavatti et al. · 2017 · 51 citations

Engineering, Electrical Engineering, Circuit Theory +13

Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system

Dong Kyun Sohn, Ji‐Soo Park, Byung Hak Lee et al. · Applied Physics Letters · 1998 · 30 citations

Engineering, Materials Engineering, Materials Science +17