Imprint lithography with sub-10 nm feature size and high throughput

References

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	Year	Citations
Imprint of sub-25 nm vias and trenches in polymers Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom Applied Physics Letters EngineeringPorous PolymerPolymersLithography ProcessBeam Lithography	1995	2.7K
Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol ‘‘ink’’ followed by chemical etching Amit Kumar, George M. Whitesides Applied Physics Letters Materials ScienceChemical EtchingRubber StampEngineeringMicrofabrication	1993	1.6K
Nanoscale patterning and oxidation of H-passivated Si(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope Joseph W. Lyding, T. C. Shen, J. S. Hubacek, Applied Physics Letters EngineeringUltrahigh VacuumVacuum DeviceSilicon On InsulatorTunneling Microscopy	1994	489
Imaging and modification of polymers by scanning tunneling and atomic force microscopy T. R. Albrecht, Moris Dovek, C. A. Lang, Journal of Applied Physics Atomic Force MicroscopyEngineeringPolymer NanotechnologyMicroscopyNanostructured Polymer	1988	165
Lithography with the scanning tunneling microscope M. A. McCord, R. F. W. Pease Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringElectron-beam LithographyMicroscopyElectronic DevicesTunneling Microscopy	1986	152
250-Å linewidths with PMMA electron resist A. N. Broers, J. M. E. Harper, W. W. Molzen Applied Physics Letters Materials ScienceElectrical EngineeringEngineeringElectron-beam LithographyMicrofabrication	1978	136
Replication of 175-Å lines and spaces in polymethylmethacrylate using x-ray lithography D. C. Flanders Applied Physics Letters X-ray CrystallographyX-ray SpectroscopyEngineeringMicroscopyChemistry	1980	72
Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm K. Early, Mark L. Schattenburg, Henry I. Smith Microelectronic Engineering Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	1990	70
Fabrication of planar quantum magnetic disk structure using electron beam lithography, reactive ion etching, and chemical mechanical polishing Peter R. Krauss, Stephen Y. Chou Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Magnetic PropertiesEngineeringElectron-beam LithographyReactive Ion EtchingMagnetic Materials	1995	56

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