Imprint Lithography

Imprint Lithography is a soft lithography technique that involves patterning a resist layer by mechanically deforming it with a mold to transfer a nanoscale pattern, distinguished from other patterning methods by its reliance on direct physical impression rather than photonic or electronic exposure.

742

Publications

38.8K

Citations

2.7K

Authors

560

Institutions

Publications per year

2017–2026

99

Authors

2.7K

  1. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    44 publications · 3.1K citations

    29

    h-index

  2. SV
    S. V. Sreenivasan

    The University of Texas at Austin, United States

    38 publications · 2.4K citations

    23

    h-index

  3. JG
    John G. Ekerdt

    The University of Texas at Austin, United States

    20 publications · 1.9K citations

    19

    h-index

  4. DJ
    Douglas J. Resnick

    Motorola (United States), United States

    33 publications · 1.1K citations

    19

    h-index

  5. HL
    Heon Lee

    Korea University, South Korea

    28 publications · 1.2K citations

    18

    h-index

1–5 of 2.7K

Venues

  1. 35

    h-index

  2. Microelectronic Engineering

    84 publications · 2.7K citations

    27

    h-index

  3. Nanotechnology

    40 publications · 1.7K citations

    23

    h-index

  4. 22

    h-index

  5. Advanced Materials

    28 publications · 4K citations

    22

    h-index

1–5