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Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol ‘‘ink’’ followed by chemical etching
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3
References
1993
Year
Materials ScienceChemical EtchingRubber StampEngineeringMicrofabricationNanotechnologyMaterials FabricationSurface ScienceApplied PhysicsFabrication TechniquePattern TransferElastomeric StampSurface NanotechnologyGold SubstrateNanolithographyNanofabricationGold SubstratesNanolithography Method
This letter describes a technique that can be used to produce well‑defined features of gold. The technique patterns a self‑assembled monolayer on gold using an elastomer stamp (phenol‑formaldehyde or PDMS) and then selectively etches the exposed gold in aqueous 1 M KOH/0.1 M KCN with dissolved O₂. The method yields electrically conductive gold structures as small as 1 µm, is straightforward once a stamp is fabricated, and enables rapid, clean‑room‑free, high‑throughput production of multiple copies.
This letter describes a technique that can be used to produce well-defined features of gold. The technique involves patterning of a self-assembled monolayer (SAM) on a gold substrate using an elastomer stamp (fabricated either from a phenol-formaldehyde polymer or polydimethylsiloxane), followed by selective etching in an aqueous, basic solution of cyanide ion and dissolved dioxygen (1M KOH, 0.1 M KCN). Electrically conductive structures of gold with dimensions as small as 1 μm have been produced using this procedure. Once a rubber stamp is fabricated, patterning and etching of gold substrates is straightforward. This method is convenient, does not require routine access to clean rooms and photolithographic equipment, and can be used to produce multiple copies of a pattern.
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