Concepedia

Author

K. Early

AT&T (United States)

Also Known As

K. Early, Kathy Early, Kevin Early

19

Publications

212

Citations

8

H-Index

35

Concepts

All Affiliations

AT&T (United States)Massachusetts Institute of TechnologyMKS Instruments (United States)
KE

About

K. Early is an author at AT&T (United States) specializing in engineering, applied physics, and materials science.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

7

7

174

2

Applied Physics

7

7

174

3

Materials Science

5

5

124

4

Electrical Engineering

2

2

50

5

Health Sciences

1

1

13

K. Early

×

7

Publications

174

Citations

7

H-Index

YearCitations

Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm

K. Early, Mark L. Schattenburg, Henry I. Smith

Microelectronic Engineering

1990

70

89-GHz f/sub T/ room-temperature silicon MOSFETs

Ran Yan, K.F. Lee, Dae‐Young Jeon,

IEEE Electron Device Letters

1992

28

High performance 0.1- mu m room temperature Si MOSFETs

Ran Yan, K.F. Lee, Dae‐Young Jeon,

2003

22

Fabrication and characterization of high-flatness mesa-etched silicon nitride x-ray masks

A. Moel, K. Early, Y. Ku,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1991

18

Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographies

K. Early, D. M. Tennant, Dae‐Young Jeon,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1992

13

Fabrication and testing of 0.1-μm-linewidth microgap x-ray masks

Mark L. Schattenburg, K. Early, Y. Ku,

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

1990

13

Characterization of AZ PN114 resist for soft-x-ray projection lithography

K. Early, D. M. Tennant, Dae‐Young Jeon,

Applied Optics

1993

10

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