Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm - Concepedia

Concepedia

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Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm

70

Citations

10

References

1990

Year

K. Early, Mark L. Schattenburg, Henry I. Smith

Microelectronic Engineering

Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabricationMicroscopyX-ray DiffractionApplied PhysicsResolution DegradationX-ray LithographyMicroelectronicsNanolithography Method

References

	Year	Citations

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