High-resolution fused silica mold fabrication for UV-nanoimprint

Substrate bias effects in high-aspect-ratio SiO2 contact etching using an inductively coupled plasma reactor

A. C. Westerheim, A. H. Labun, J. H. Dubash et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 91 citations

Engineering, Materials Engineering, Materials Science +16

Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

David P. Mancini, K. A. Gehoski, Eric S. Ainley et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 52 citations

Engineering, Materials Engineering, Materials Science +17

Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silica

A. V. Sankaran, Mark J. Kushner · Applied Physics Letters · 2003 · 51 citations

Natural Sciences, Materials Engineering, Materials Science +15

Plasma etching characteristics of chromium film and its novel etching mode

H. Nakata, K. Nishioka, Haruhiko Abe · Journal of Vacuum Science and Technology · 1980 · 42 citations

Natural Sciences, Materials Engineering, Materials Science +16

Effect of sidewall properties on the bottom microtrench during SiO2 etching in a CF4 plasma

Jae-Ho Min, Gye-Re Lee, Jin-Kwan Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 23 citations

Engineering, Materials Engineering, Materials Science +16