H. Nakata

Plasma etching characteristics of chromium film and its novel etching mode

H. Nakata, K. Nishioka, Haruhiko Abe · Journal of Vacuum Science and Technology · 1980 · 42 citations

Natural Sciences, Materials Engineering, Materials Science +16

A 5-V-only 16-Mb flash memory with sector erase mode

T. Jinbo, H. Nakata, K. Hashimoto et al. · IEEE Journal of Solid-State Circuits · 1992 · 34 citations

Engineering, Computer Engineering, Electrical Engineering +12

SOI/SOI/Bulk-Si triple-level structure for three-dimensional devices

Kengo Sugahara, T. Nishimura, S. Kusunoki et al. · IEEE Electron Device Letters · 1986 · 32 citations

Engineering, Electrical Engineering, Materials Science +17

Loading Effect and Temperature Dependence of Etch Rate in CF₄Plasma

Tatsuya Enomoto, Masahiko Denda, A. Yasuoka et al. · Japanese Journal of Applied Physics · 1979 · 29 citations

Natural Sciences, Physics, Plasma Physics +15

Plasma Anodic Nitridation of Silicon in  N 2 ‐  H 2 System

Makoto Hirayama, Takashi Matsukawa, Hideaki Arima et al. · Journal of The Electrochemical Society · 1984 · 26 citations

Engineering, Materials Engineering, Materials Science +14