A. C. Westerheim

Substrate bias effects in high-aspect-ratio SiO2 contact etching using an inductively coupled plasma reactor

A. C. Westerheim, A. H. Labun, J. H. Dubash et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 89 citations

Engineering, Electron-beam Lithography, Silicon On Insulator +17

Relation between electrical properties and microstructure of YBa2Cu3O7−<i>x</i> thin films deposited by single-target off-axis sputtering

A. C. Westerheim, Alfredo C. Anderson, D.E. Oates et al. · Journal of Applied Physics · 1994 · 37 citations · Full text

Superconducting Material, Engineering, Thin Film Process Technology +17

Off-axis magnetron sputtering of YBCO films: the influence of atomic oxygen

A. C. Westerheim, L.S. Yu-Jahnes, Adam Campbell Anderson · IEEE Transactions on Magnetics · 1991 · 34 citations

Superconducting Material, Engineering, Sputtering Chamber +17

Microstructural dependence of sputtered YBa2Cu3O7-x thin films on deposition parameters

Deepa Bhatt, Soumendra N. Basu, A. C. Westerheim et al. · Physica C Superconductivity · 1994 · 22 citations

Materials Science, Engineering, Deposition Parameters +8

Integration of chemical vapor deposition titanium nitride for 0.25 μm contacts and vias

A. C. Westerheim, J. M. Bulger, Caroline Whelan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 17 citations · Full text

Engineering, μM Contacts, Chemical Deposition +16