High resolution lithography with PDMS molds

Abstract

The resolution, dimension stability, and reproducibility of the Soft UV-Nanoimprint is investigated. The potential for imprinting nanostructures with flexible molds in UV-curable resists in the 100nm regime are explored and the limitations analyzed. The dimensional stability of imprinted patterns is determined by the deformation of the mold that in term depends on the geometry of the structures and the imprint pressure applied.