Concepedia

Overlay Metrology

Overlay Metrology is a metrological technique within microfabrication that quantifies the alignment accuracy between successive lithographic layers on a semiconductor wafer by measuring deviations from intended positional registration.

115

Publications

2.5K

Citations

553

Authors

86

Institutions

Publications per year

2017–2026

18

Parents

Publications

115

Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing

Arie J. den Boef · Surface Topography Metrology and Properties · 2016 · 119 citations

, , +16

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 89 citations

, , +13

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, M. M. Hanna, Hannah Wei et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 68 citations

, , +17

Device based in-chip critical dimension and overlay metrology

Young‐Nam Kim, Jong-Sun Paek, Silvio Rabello et al. · Optics Express · 2009 · 50 citations · Full text

, , +17

Multiple linear regression analysis of the overlay accuracy model

Zone‐Ching Lin, Wen-Jang Wu · IEEE Transactions on Semiconductor Manufacturing · 1999 · 50 citations

, , +12

1–5 of 115

Authors

553

  1. KB
    Kaustuve Bhattacharyya

    ASML (Netherlands), Netherlands

    12 publications · 239 citations

    11

    h-index

  2. MK
    Michael Kubis

    ASML (Netherlands), Netherlands

    8 publications · 191 citations

    8

    h-index

  3. AD
    Arie den Boef

    ASML (Netherlands), Netherlands

    7 publications · 163 citations

    7

    h-index

  4. PL
    Philippe Leray

    IMEC, Belgium

    7 publications · 116 citations

    7

    h-index

  5. AF
    Andreas Fuchs

    ASML (Netherlands), Netherlands

    6 publications · 132 citations

    6

    h-index

1–5 of 553

Institutions

86

  1. ASML (Netherlands)

    Veldhoven, The Netherlands

    19 h-index

    230 publications

    5.8K citations

  2. KLA (Israel)

    Migdal HaEmeq, Israel

    12 h-index

    70 publications

    1.3K citations

  3. Taiwan Semiconductor Manufacturing Company (Taiwan)

    Hsinchu, Taiwan

    9 h-index

    49 publications

    887 citations

  4. IMEC

    Leuven, Belgium

    9 h-index

    20 publications

    625 citations

  5. National Institute of Standards and Technology

    Gaithersburg, United States

    6 h-index

    33 publications

    573 citations

  6. Hitachi High-Tech (Japan)

    Tokyo, Japan

    5 h-index

    18 publications

    237 citations

  7. IBM (United States)

    Armonk, United States

    5 h-index

    19 publications

    256 citations

  8. Hitachi (Japan)

    Tokyo, Japan

    5 h-index

    18 publications

    237 citations

1–8 of 86

Venues

  1. 20

    h-index

  2. Optics Express

    5 publications · 129 citations

    5

    h-index

  3. 4

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 4 publications · 63 citations

    4

    h-index

  5. Microelectronic Engineering

    4 publications · 62 citations

    4

    h-index

1–5