Concepedia

Mask Inspection

Mask Inspection is a quality control methodology within the field of photolithography that systematically identifies and characterizes defects on photomasks to ensure the fidelity and accuracy of integrated circuit patterns during semiconductor manufacturing.

199

Publications

4.1K

Citations

757

Authors

132

Institutions

Publications per year

2017–2026

20

Parents

Publications

199

Inverse Lithography Technology (ILT): what is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 82 citations

, , +13

Water soluble conducting polyanilines: Applications in lithography

Marie Angelopoulos, Niranjan Patel, Jane M. Shaw et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 81 citations

, , +16

X-ray mask repair with focused ion beams

Alfred Wagner, James P. Levin, J. L. Mauer et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 76 citations

, , +17

Toward automatic mask and source optimization for optical lithography

Andreas Erdmann, Tim Fuehner, Thomas Schnattinger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 60 citations

, , +14

Extreme Ultraviolet Lithography Development in the United States

Stefan Wurm · Japanese Journal of Applied Physics · 2007 · 53 citations

, , +14

1–5 of 199

Authors

757

  1. TW
    Takeo Watanabe

    University of Hyogo, Japan

    20 publications · 417 citations

    15

    h-index

  2. HK
    Hiroo Kinoshita

    University of Hyogo, Japan

    21 publications · 432 citations

    15

    h-index

  3. TT
    Tsuneo Terasawa

    National Institute of Advanced Industrial Science and Technology, Japan

    18 publications · 385 citations

    14

    h-index

  4. KA
    Kenneth A. Goldberg

    Lawrence Berkeley National Laboratory, United States

    13 publications · 216 citations

    12

    h-index

  5. IM
    Iacopo Mochi

    Lawrence Berkeley National Laboratory, United States

    13 publications · 233 citations

    12

    h-index

1–5 of 757

Institutions

132

  1. University of Hyogo

    Kobe, Japan

    15 h-index

    83 publications

    1.6K citations

  2. Lawrence Berkeley National Laboratory

    Berkeley, United States

    14 h-index

    60 publications

    1K citations

  3. Carl Zeiss (Germany)

    Oberkochen, Germany

    13 h-index

    71 publications

    1.6K citations

  4. Intel (United States)

    Santa Clara, United States

    13 h-index

    58 publications

    1.1K citations

  5. Lawrence Livermore National Laboratory

    Livermore, United States

    11 h-index

    29 publications

    434 citations

  6. IMEC

    Leuven, Belgium

    9 h-index

    31 publications

    568 citations

  7. Japan Science and Technology Agency

    Tokyo, Japan

    8 h-index

    37 publications

    717 citations

  8. University of California, Berkeley

    Berkeley, United States

    8 h-index

    14 publications

    298 citations

1–8 of 132

Venues

  1. 23

    h-index

  2. Japanese Journal of Applied Physics

    JJAP · 16 publications · 307 citations

    14

    h-index

  3. 13

    h-index

  4. Journal of Micro/Nanolithography MEMS and MOEMS

    12 publications · 280 citations

    11

    h-index

  5. Microelectronic Engineering

    5 publications · 74 citations

    5

    h-index

1–5