Takeo Watanabe - Concepedia

Author

Takeo Watanabe

Also Known As

T Watanabe, T. WATANABE, T. Watanabe, T.Watanabe, TAKEO WATANABE, Takeo WATANABE, Takeo Watanabe, Takeo Watanabe Takeo Watanabe

393

Publications

2.8K

Citations

H-Index

153

Concepts

All Affiliations

University of Hyogo Himeji University Japan Science and Technology Agency Hoya (Japan)Tokyo Ohka Kogyo (Japan)

About

Takeo Watanabe is an author at University of Hyogo specializing in engineering, optical properties, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	24	91	2K
2	Medicine	14	17	381
3	Health Sciences	13	14	318
4	Natural Sciences	12	13	219
5	Education	2	2	36

Takeo Watanabe

101

Publications

2.1K

Citations

H-Index

Page 1

	Year	Citations
Synthesis of Sterically Hindered Biaryls via the Palladium-Catalyzed Cross-Coupling Reaction of Arylboronic Acids or their Esters with Haloarenes Takeo Watanabe, Norio Miyaura, Akira Suzuki Synlett Arylboronic AcidsChemical EngineeringCross-coupling ReactionEngineeringSterically Hindered Biaryls	1992	271
Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU Tetsuo Harada, Junki Kishimoto, Takeo Watanabe, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Numerical ApertureCoherent Extreme UltravioletEngineeringElectron-beam LithographyOphthalmology	2009	50
Stereoselective synthesis of allylic boronates via palladium-catalyzed cross-coupling reaction of Knochel's (dialkoxyboryl) methylzinc reagents with 1-halo-1-alkenes Takeo Watanabe, Norio Miyaura, Akira Suzuki Journal of Organometallic Chemistry Cross-coupling ReactionEngineeringAlkene MetathesisOrganic ChemistryPalladium-catalyzed Cross-coupling Reaction	1993	47
Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU Takeo Watanabe, Hiroo Kinoshita, Noriyuki Sakaya, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyIon Beam InstrumentationChemistryResist Development	2005	42
High-exposure-durability, high-quantum-efficiency (>90%) backside-illuminated soft-X-ray CMOS sensor Tetsuo Harada, Nobukazu Teranishi, Takeo Watanabe, Applied Physics Express PhotonicsDead-layer ThicknessEngineeringRadiation DetectionPhysics	2019	39
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy Takeo Watanabe, Hiroo Kinoshita, Hajime Nii, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Vacuum EnvironmentChemical EngineeringMass SpectroscopyExtreme Ultraviolet LithographyKrf Lithography	2001	37
Development of High-Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials Masaki Kuki, Tomoyuki Uemura, Masato Yamaguchi, Journal of Photopolymer Science and Technology Optical MaterialsX-ray SpectroscopyEngineeringMultilayer CoatingX-ray Fluorescence	2015	36
Sounding rocket experiment of bare electrodynamic tether system Hironori Fujii, Takeo Watanabe, Hirohisa Kojima, Acta Astronautica EngineeringAerospace EngineeringRocket EnginePropulsionAerospace Propulsion	2008	36
Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU Tetsuo Harada, Masato Nakasuji, Masaki Tada, Japanese Journal of Applied Physics Ultraviolet LightEngineeringMicroscopyExtreme UltravioletElectron Microscopy	2011	35
Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope Tetsuo Harada, Yusuke Tanaka, Takeo Watanabe, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyDefect-free Mask ProductionBeam Lithography	2013	34

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