Hiroo Kinoshita - Concepedia

Author

Hiroo Kinoshita

Also Known As

H. KINOSHITA, H. Kinoshita, HIROO KINOSHITA, Hiroo KINOSHITA, Hiroo Kinoshita, Hiroo Kinoshita Hiroo Kinoshita, hiroo KINOSHITA

272

Publications

2.6K

Citations

H-Index

138

Concepts

All Affiliations

University of Hyogo Japan Science and Technology Agency Himeji University Hoya (Japan)NTT Basic Research Laboratories

About

Hiroo Kinoshita is an author at University of Hyogo specializing in engineering, applied physics, and optical properties.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	23	88	2K
2	Medicine	14	18	394
3	Health Sciences	13	16	593
4	Natural Sciences	12	14	237
5	Education	1	1	10

Hiroo Kinoshita

Publications

2.1K

Citations

H-Index

Page 1

	Year	Citations
Soft x-ray reduction lithography using multilayer mirrors Hiroo Kinoshita, K. Kurihara, Yui Ishii, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Optical MaterialsEngineeringMicroscopyOptic DesignLaser Applications	1989	269
Optical properties and Faraday effect of ceramic terbium gallium garnet for a room temperature Faraday rotator Hidetsugu Yoshida, Koji Tsubakimoto, Yasushi Fujimoto, Optics Express PhotonicsElectrical EngineeringOptical MaterialsSingle Crystal TggEngineering	2011	126
Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU Tetsuo Harada, Junki Kishimoto, Takeo Watanabe, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Numerical ApertureCoherent Extreme UltravioletEngineeringElectron-beam LithographyOphthalmology	2009	50
Printability of native blank defects and programmed defects and their stack structures Hyuk Joo Kwon, Jenah Harris-Jones, Ranganath Teki, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyNative Blank DefectsDefect Tolerance	2011	47
Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU Takeo Watanabe, Hiroo Kinoshita, Noriyuki Sakaya, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyIon Beam InstrumentationChemistryResist Development	2005	42
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy Takeo Watanabe, Hiroo Kinoshita, Hajime Nii, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Vacuum EnvironmentChemical EngineeringMass SpectroscopyExtreme Ultraviolet LithographyKrf Lithography	2001	37
Development of High-Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials Masaki Kuki, Tomoyuki Uemura, Masato Yamaguchi, Journal of Photopolymer Science and Technology Optical MaterialsX-ray SpectroscopyEngineeringMultilayer CoatingX-ray Fluorescence	2015	36
Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU Tetsuo Harada, Masato Nakasuji, Masaki Tada, Japanese Journal of Applied Physics Ultraviolet LightEngineeringMicroscopyExtreme UltravioletElectron Microscopy	2011	35
Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope Tetsuo Harada, Yusuke Tanaka, Takeo Watanabe, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyDefect-free Mask ProductionBeam Lithography	2013	34
Multilayers for next generation EUVL at 6.X nm Yuriy Y. Platonov, Jim Rodriguez, Michael D. Kriese, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Peak ReflectivityOptical MaterialsEngineeringShort Wavelength OpticElectron-beam Lithography	2011	33

Page 1