Jane M. Shaw

Characterization of positive photoresist

F.H. Dill, W.P. Hornberger, P.S. Hauge et al. · IEEE Transactions on Electron Devices · 1975 · 416 citations

Positive Photoresist Exposure, Image Formation, Functional Parameters +14

Micromachining applications of a high resolution ultrathick photoresist

Kangsik Lee, N. LaBianca, S. A. Rishton et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 379 citations

Engineering, Electron-beam Lithography, Microscopy +17

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 336 citations

Photonics, Electrical Engineering, Optical Materials +14

Single-Step Optical Lift-Off Process

M. Hatzakis, B. J. Canavello, Jane M. Shaw · IBM Journal of Research and Development · 1980 · 210 citations

Optical Materials, Engineering, ®Az Resist +17

Surface modification of PMDA-oxydianiline polyimide. Surface structure-adhesion relationship

Kang Wook Lee, Steven P. Kowalczyk, Jane M. Shaw · Macromolecules · 1990 · 106 citations

Materials Science, Macromolecular Science, Engineering +14