Jane M. Shaw

Characterization of positive photoresist

F.H. Dill, W.P. Hornberger, P.S. Hauge et al. · IEEE Transactions on Electron Devices · 1975 · 422 citations

Natural Sciences, Materials Engineering, Optical Materials +9

Micromachining applications of a high resolution ultrathick photoresist

Kangsik Lee, N. LaBianca, S. A. Rishton et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 380 citations

Engineering, Materials Engineering, Materials Science +17

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 339 citations

Engineering, Chemistry, Materials Science +14

Single-Step Optical Lift-Off Process

M. Hatzakis, B. J. Canavello, Jane M. Shaw · IBM Journal of Research and Development · 1980 · 211 citations

Engineering, Materials Engineering, Materials Science +13

Surface modification of PMDA-oxydianiline polyimide. Surface structure-adhesion relationship

Kang Wook Lee, Steven P. Kowalczyk, Jane M. Shaw · Macromolecules · 1990 · 106 citations

Natural Sciences, Chemistry, Materials Science +15