Jeffrey D. Gelorme

<i>N</i>-type organic thin-film transistor with high field-effect mobility based on a N,N′-dialkyl-3,4,9,10-perylene tetracarboxylic diimide derivative

Patrick R. L. Malenfant, Christos Dimitrakopoulos, Jeffrey D. Gelorme et al. · Applied Physics Letters · 2002 · 447 citations

Materials Science, Electronic Devices, Engineering +15

Micromachining applications of a high resolution ultrathick photoresist

Kangsik Lee, N. LaBianca, S. A. Rishton et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 379 citations

Engineering, Electron-beam Lithography, Microscopy +17

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 336 citations

Photonics, Electrical Engineering, Optical Materials +14

&lt;title&gt;High-aspect-ratio resist for thick-film applications&lt;/title&gt;

N. LaBianca, Jeffrey D. Gelorme · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 114 citations

Introducing Biobased Materials into the Electronics Industry

Laura L. Kosbar, Jeffrey D. Gelorme, Robert M. Japp et al. · Journal of Industrial Ecology · 2000 · 90 citations