J. L. Mauer - Concepedia

Author

J. L. Mauer

IBM (United States)

Also Known As

J. L. Mauer, J. L. Mauer IV, J. Mauer, J.L. Mauer, John L. Mauer, John Mauer

Publications

576

Citations

H-Index

Concepts

All Affiliations

IBM (United States)IBM Research - Thomas J. Watson Research Center

About

J. L. Mauer is an author at IBM (United States) specializing in engineering, microelectronics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	400
2	Applied Physics	6	6	314
3	Health Sciences	1	1	76
4	Medicine	1	1	76
5	Natural Sciences	1	1	45

J. L. Mauer

Publications

490

Citations

H-Index

Page 1

	Year	Citations
Mechanism of silicon etching by a CF4 plasma J. L. Mauer, J. S. Logan, L. B. Zielinski, Journal of Vacuum Science and Technology Materials ScienceEngineeringPhysicsMicrofabricationSurface Science	1978	98
X-ray mask repair with focused ion beams Alfred Wagner, James P. Levin, J. L. Mauer, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Ion ImplantationHealth SciencesOphthalmologyMicroscopyOpaque Repair	1990	76
A variable-stress shallow trench isolation (STL) technology with diffused sidewall doping for submicron CMOS B. Davari, Charles W. Koburger, T. Furukawa, EngineeringVlsi DesignSubmicron CmosIntegrated CircuitsInterconnect (Integrated Circuits)	2003	57
A new planarization technique, using a combination of RIE and chemical mechanical polish (CMP) B. Davarik, Charles W. Koburger, R. Schulz, EngineeringEmerging Memory TechnologyMechanical EngineeringIntegrated CircuitsChemical Engineering	2003	55
Measurement of Total Inelastic Cross Sections for Electron Impact in N2 and CO2 David J. Spence, J. L. Mauer, G. J. Schulz The Journal of Chemical Physics EngineeringNuclear PhysicsMeasurementElectron DiffractionChemistry	1972	45
Focused ion beam imaging of grain growth in copper thin films J. Gupta, J. M. E. Harper, J. L. Mauer, Applied Physics Letters EngineeringMicroscopyGrain SizeElectron MicroscopyIon Beam	1992	41
An advanced high-performance trench-isolated self-aligned bipolar technology G.P. Li, T.H. Ning, C.T. Chuang, IEEE Transactions on Electron Devices Electrical EngineeringElectronic DevicesEngineeringHigh-speed ElectronicsVlsi Design	1987	41
Electron Optics of an Electron-Beam Lithographic System J. L. Mauer, H. C. Pfeiffer, W. Stickel IBM Journal of Research and Development EngineeringElectron-beam LithographyMicroscopyElectron OpticBeam Optic	1977	18
73ps si bipolar ECL circuits D.D. Tang, G.P. Li, Ching-Te Chuang, Electrical EngineeringEngineeringVlsi DesignCircuit SystemMixed-signal Integrated Circuit	1986	16
Reactant supply in reactive ion etching J. L. Mauer, J. S. Logan Journal of Vacuum Science and Technology Chemical EngineeringEngineeringMicrofabricationEtch RateTotal Dissociation	1979	15

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