J. S. Logan - Concepedia

Author

J. S. Logan

IBM (United States)

Also Known As

J. Logan, J. S. Logan, J.S. Logan, Joseph Logan, Joseph S. Logan

Publications

654

Citations

H-Index

Concepts

All Affiliations

IBM (United States)IBM Research - Thomas J. Watson Research Center

About

J. S. Logan is an author at IBM (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	12	602
2	Applied Physics	10	10	542
3	Natural Sciences	1	1	24
4	Chemical Engineering	1	1	15
5	Chemistry	1	1	15

J. S. Logan

Publications

602

Citations

H-Index

Page 1

	Year	Citations
Stabilization of SiO<sub>2</sub> Passivation Layers with P<sub>2</sub>O<sub>5</sub> D. R. Kerr, J. S. Logan, P. J. Burkhardt, IBM Journal of Research and Development SemiconductorsNpn Silicon TransistorsElectrical EngineeringSemiconductor TechnologyEngineering	1964	121
Mechanism of silicon etching by a CF4 plasma J. L. Mauer, J. S. Logan, L. B. Zielinski, Journal of Vacuum Science and Technology Materials ScienceEngineeringPhysicsMicrofabricationSurface Science	1978	98
Copper deposition by electron cyclotron resonance plasma W. M. Holber, J. S. Logan, H. J. Grabarz, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Electrical EngineeringCopper DepositionEngineeringPlasma ElectronicsPhysics	1993	84
Control of RF Sputtered Film Properties Through Substrate Tuning J. S. Logan IBM Journal of Research and Development Materials ScienceElectrical EngineeringEngineeringPhysical PropertiesMicrofabrication	1970	62
A VLSI Bipolar Metallization Design with Three-Level Wiring and Area Array Solder Connections L. J. Fried, J. Havas, J. S. Lechaton, IBM Journal of Research and Development EngineeringIntegrated CircuitsThree-level WiringMetal Pattern DefinitionSingle Chip	1982	57
Electrical Characterization of Radio-Frequency Sputtering Gas Discharge J. S. Logan, N. M. Mazza, P. D. Davidse Journal of Vacuum Science and Technology Electrical EngineeringEngineeringConductance IncreaseElectrical ImpedanceElectrical Equivalent	1969	45
High-rate reactive sputter deposition of aluminum oxide Fletcher Jones, J. S. Logan Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials EngineeringSurface TechnologyMaterials ScienceAluminium NitrideEngineering	1989	29
Metal Edge Coverage and Control of Charge Accumulation in RF Sputtered Insulators J. S. Logan, F. S. Maddocks, P. D. Davidse IBM Journal of Research and Development EngineeringMetal Edge CoverageCharge AccumulationArgon Ion BombardmentSilicon On Insulator	1970	29
The rf glow-discharge sputtering model J. S. Logan, John H. Keller, R. G. Simmons Journal of Vacuum Science and Technology EngineeringElectron-beam LithographyGlow DischargeChemical DepositionElectromagnetic Compatibility	1977	25
Study of particle emission in vacuum from film deposits J. S. Logan, James McGill Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringExcessive Particle GenerationBlastingVacuum DevicePlasma Processing	1992	24

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