Statistics
Publications
5
Citations
235
H-Index
5
Active since
2005
Affiliations
Luminex (United States)(Current)
Dan Abrams is an author at Luminex (United States) specializing in mask fabrication, engineering, and mask design.
Publications per year
2005–2020
5
5
Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45nm and 32nm
Linyong Pang, Yong Liu, Dan Abrams · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 34 citations
Engineering, Manufacturing Engineering, Design Automation +14
Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm
Linyong Pang, Yong Liu, Thuc Dam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 22 citations
Engineering, Manufacturing Engineering, Design Automation +14
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